A measurement breakthrough to enable robust large-area printing of electronics

A measurement breakthrough to enable robust large-area printing of electronics

12/20/2012
High-speed solution shearing, in which a drop of dissolved material is spread by a coating knife onto the substrate, has emerged as a versatile, yet simple coating technique to prepare high-mobility organic thin film transistors, and is a simple lab-based prototype for large-area slot-die coating. We have used in situ microbeam grazing incidence wide-angle X-ray scattering (μGIWAXS) and optical microscopy, simultaneously, to probe the crystallization during the coating process. In this collaboration between Dr Smilgies (Cornell High Energy Synchrotron Source), the Amassian group and the Bao group (Stanford), we demonstrate an approach which can be used to study solution based crystal nucleation and growth, and identify casting parameter combinations that promises to yield optimal device performance.
 
 
[Smilgies, D.-M., Li, R., Giri, G., Chou, K. W., Diao, Y., Bao, Z. and Amassian, A. (2012), Look fast: Crystallization of conjugated molecules during solution shearing probed in-situ and in real time by X-ray scattering. Phys. Status Solidi RRL. doi: 10.1002/pssr.201206507]