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Total result(s) found: 6
  • A. Amassian, M. Svec, P. Desjardins, L. Martinu, “Dynamics of ion bombardment-induced modifications at the radio-frequency-biased electrode in low-pressure oxygen plasmas: In situ spectroscopic ellipsometry and Monte Carlo Study” J. Appl. Phys. 100 (2006) 063526.
Keywords:
oxygen, silicon, elemental semiconductors, plasma immersion ion implantation, ion beam effects, plasma diagnostics, Monte Carlo methods, plasma simulation, plasma-wall interactions, surface treatment, oxidation, sputtering
  • A. Amassian, M. Svec, P. Desjardins, L. Martinu, “Interface broadening due to ion mixing during thin film growth in plasma-enhanced chemical vapor deposition environment” J. Vac. Sci. Technol. A24 (2006) 2061.
Keywords:
titanium compounds, ion beam mixing, plasma CVD, ion beam assisted deposition, ellipsometry, oxidation, transmission electron microscopy, ion-surface impact, Monte Carlo methods, interface phenomena
  • A. Amassian, M. Gaidi, M. Chaker, L. Martinu, “Optical depth profiling of STO and electro-optic PLZT multilayer structures for active waveguide applications” J. Vac. Sci. Technol. A24 (2006) 55.
Keywords:
strontium compounds, lanthanum compounds, zirconium compounds, optical multilayers, dielectric materials, dielectric thin films, porous materials, claddings, electro-optical effects, transparency, pulsed laser deposition, refractive index, ellipsometry, a
  • R. Vernhes, A. Amassian, J. E. Klemberg-Sapieha, L. Martinu, “RF plasma treatment of porous SiNx:H films for the fabrication of porous-dense multilayer optical filters with optimized interfaces” J. Appl. Phys. 99 (2006) 114315.
Keywords:
silicon compounds, hydrogen, thin films, porous materials, surface treatment, optical filters, optical multilayers, refractive index, plasma CVD, sputtering, annealing, atomic force microscopy, surface roughness
  • P. Jedrzejowski, A. Amassian, E. Bousser, J. E. Klemberg-Sapieha, L. Martinu, "Real-time in situ growth study of TiN - and TiCxNy - based superhard nanocomposite coatings using spectroscopic ellipsometry” Appl. Phys. Lett. 88 (2006) 388.
Keywords:
hin film structure and morphology, Theory and models of film growth, Optical constants, Charge carriers: generation, recombination, lifetime, and trapping, Nanoparticles, Methods of nanofabrication and processing
  • J. P. Masse, H. Szymanowski, O. Zabeida, A. Amassian, J. E. Klemberg-Sapieha, L. Martinu, “Effect of annealing on the optical properties of plasma-deposited Ta2O5 and Nb2O5 films” Thin Solid Films 515 (2006) 1674.
Keywords:
tantalum oxide; niobium oxide; plasma processing and deposition; optical properties; ellipsometry; phase transitions; X-ray diffraction