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Total result(s) found: 6
  • R. R. Bhattacharjee, R. Li, L. Estevez, D.-M. Smilgies, A. Amassian, E. P. Giannelis, “A nanocomposite fluid with tunable plasmonic properties” J. Mater. Chem. 19 (2009) 8728.
Keywords:
NA
  • A. Amassian, V. A. Pozdin, T. V. Desai, S. Hong, A. R. Woll, J. D. Ferguson, J. D. Brock, G. G. Malliaras, J. R. Engstrom, “Post-deposition reorganization of pentacene films deposited on low-energy surfaces” J. Mater. Chem. 19 (2009) 5580. (invited paper)
Keywords:
NA
  • A. Amassian, T. V. Desai, S. Kowarik, S. Hong, A. R. Woll, G. G. Malliaras, F. Schreiber, J. R. Engstrom, “Coverage dependent adsorption dynamics in hyperthermal organic thin film growth”, J. Chem. Phys. 130 (2009) 124701.
Keywords:
adsorption, silicon compounds, thin films, X-ray scattering
  • A. Papadimitratos, A. Amassian, A. S. Killampalli, J. L. Mack, G. G. Malliaras, J. R. Engstrom, “Organic thin film transistors of pentacene films fabricated from a supersonic molecular beam source”, Appl. Phys. A 95 (2009) 29. (invited paper)
Keywords:
NA
  • A. Amassian, M. Dudek, O. Zabeida, S. C. Gujrathi, J. E. Klemberg-Sapieha, L. Martinu, “Oxygen incorporation and Donor Activation via Subplantation during growth of indium tin oxide films”, J. Vac. Sci. Technol A 27 (2009) 362.
Keywords:
amorphous semiconductors, carrier density, electrical conductivity, indium compounds, ion beam effects, ion implantation, Monte Carlo methods, oxygen, plasma materials processing, semiconductor growth, semiconductor thin films, sputter deposition, stoichi
  • M. Dudek, A. Amassian, O. Zabeida, J. E. Klemberg-Sapieha, L. Martinu, “Ion bombardment-induced enhancement of the properties of indium tin oxide films prepared by plasma-assisted reactive magnetron sputtering”, Thin Solid Films 517 (2009) 4576.
Keywords:
Indium tin oxide; Ion bombardment; Optical coatings; Electrical properties and measurements